Devices
Physical Understanding and Performance Enhancement of SiC MOSFETs
Prof. Tsunenobu Kimoto
Graduate School of Engineering, Kyoto University, Japan
Abstract
High-voltage SiC power MOSFETs and Schottky barrier diodes have been penetrating the major market including HEV/EV, traction, and data centers, demonstrating remarkable energy saving. However, the performance and reliability of SiC power MOSFETs have been still far from their full potential. In the first part of this talk, recent progress in physical understanding of SiC MOSFETs such as carrier transport and trapping in the inversion layer is presented. Systematic MOS-Hall effect measurements combined with split C-V characteristics yield free electron (real) mobility, free electron density, and trapped electron density as a function of the gate voltage. These data can be successfully reproduced by theoretical calculation taking account of several scattering processes, doping-dependent fixed charges, and quantum-mechanical effects. In the second part, a great promise of SiC FinFETs is demonstrated by means of experimental fabrication and theoretical analyses. A high mobility (> 100 cm2/Vs) has been achieved for a SiC FinFET with a narrow fin width, where the spatial distribution of electrons is shifted away from the MOS interface, leading to less Coulomb scattering. By adopting the Fin-channel in SiC vertical MOSFETs, a record performance has been achieved. Social impacts of SiC power devices are also presented.
Biography
Tsunenobu Kimoto joined Sumitomo Electric Industries, Ltd. after receiving the Master degree from Kyoto University in 1988. He started his academic career as an Assistant Professor in 1990 and received the Ph.D. degree from Kyoto University in 1996 based on his work on SiC epitaxial growth and high-voltage diodes. From 1996 to 1997, he was a research fellow at Linköping University, Sweden. He is currently a Professor at Kyoto University. His main research activity has been SiC electronics including SiC power devices, high-temperature devices, MOS physics, ion implantation, optical and electrical characterization, point and extended defects, and epitaxial growth. He received the IEEE Andrew S. Grove Award in 2024 and the Japan Academy Prize in 2026. He served as the President of the Japan Society of Applied Physics in 2024 and 2025. He is the coauthor of the book "Fundamentals of Silicon Carbide Technology" (IEEE-Wiley, 2014).
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